The use of langmuir probe measurements to investigate the reaction mechanisms of remote plasma-enhanced chemical vapor deposition - Concepedia

Concepedia

Publication | Closed Access

The use of langmuir probe measurements to investigate the reaction mechanisms of remote plasma-enhanced chemical vapor deposition

19

Citations

7

References

1991

Year

B. Anthony, Tsan‐sheng Hsu, Ruizhe Qian, J. Irby, Sanjay K. Banerjee, A.F. Tasch

Journal of Electronic Materials

Chemical EngineeringEngineeringSpectroscopySurface ScienceApplied PhysicsLangmuir Probe MeasurementsChemical Vapor DepositionInstrumentationReaction MechanismsGas Discharge PlasmaChemical KineticsPlasma Processing

References

	Year	Citations

Page 1

Page 1