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Deep level defects throughout the bandgap of (010) β-Ga2O3 detected by optically and thermally stimulated defect spectroscopy
283
Citations
26
References
2016
Year
EngineeringOptoelectronic DevicesDefect ToleranceDeep Level DefectsSemiconductorsDefect StatesOptical PropertiesEv BandgapQuantum MaterialsCompound SemiconductorMaterials ScienceCrystalline DefectsPhysicsOxide ElectronicsOptoelectronic MaterialsGallium OxideSemiconductor MaterialDefect FormationSchottky Barrier HeightDefect SpectroscopyCondensed Matter PhysicsApplied PhysicsOptoelectronics
Deep level optical spectroscopy (DLOS) and deep level transient spectroscopy (DLTS) measurements performed on Ni/β-Ga2O3 Schottky diodes fabricated on unintentionally doped (010) substrates prepared by edge-defined film-fed growth revealed a rich spectrum of defect states throughout the 4.84 eV bandgap of β-Ga2O3. Five distinct defect states were detected at EC − 0.62 eV, 0.82 eV, 1.00 eV, 2.16 eV, and 4.40 eV. The EC − 0.82 eV and 4.40 eV levels are dominant, with concentrations on the order of 1016 cm−3. The three DLTS-detected traps at EC − 0.62 eV, 0.82 eV, and 1.00 eV are similar to traps reported in Czochralski-grown β-Ga2O3, [K. Irmscher et al., J. Appl. Phys. 110, 063720 (2011)], suggesting possibly common sources. The DLOS-detected states at EC − 2.16 eV and 4.40 eV exhibit significant lattice relaxation effects in their optical transitions associated with strongly bound defects. As a consequence of this study, the Ni/β-Ga2O3 (010) Schottky barrier height was determined to be 1.55 eV, with good consistency achieved between different characterization techniques.
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