Studies of metallic multilayer structures, optical properties, and oxidation using <i>in situ</i> spectroscopic ellipsometry

Abstract

In situ spectroscopic ellipsometry (SE) has been successfully used to accurately measure sputter deposition rates and optical constants of un-oxidized metal layers and to control the growth of magnetic multilayers. The structures include [Co/Cu]n, [Co/Au]n, [Co/Ni]n, [Co/Pd]n and [Co/Pd/Au]n. Layer thickness precision is better than ±0.05 nm for layer thicknesses in the range of 0.2 nm to 10 nm. Closed-loop feedback control of layer thickness is also demonstrated. Good consistency was obtained by comparing the in situ SE results to x-ray diffraction measurements. Dynamic oxidation studies of [Co/Au]n and [Co/Ni]n multilayer structures are also presented.