Atomic ordering in TiO₂ thin films studied by X‐ray reflection spectroscopy

Abstract

Abstract The paper shows the importance of soft X‐ray reflection spectroscopy as a non‐destructive in‐depth characterization tool for the middle atomic ordering in TiO 2 thin films. The microstructure of TiO 2 films synthesized by magnetron sputtering on Si(100) wafers was characterized by X‐ray reflection spectroscopy (XRS), X‐ray Diffraction (XRD) method and X‐ray reflectometry (XRR). Reflection spectra and calculated absorption spectra were analyzed in the vicinity of Ti L 2,3 and O K absorption edges. It was established that the 70 nm TiO 2 film is polycrystalline with an anatase structure and homogeneous in depth. The 10 nm TiO 2 film is amorphous. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)