The link between nanoscale feature development in a negative resist and the Hansen solubility sphere

Abstract

Abstract By systematically studying development of a high resolution, negative electron beam resist, hexa‐methyl acetoxy calix(6)arene, we have elicited a more general understanding of the underlying development mechanisms for negative resists. Using the three dimensional Hansen solubility parameters for more than 40 solvents, we have constructed a Hansen solubility sphere (HSS). From this sphere, we have estimated the Flory Huggins interaction parameter for solvents with hexa‐methyl acetoxy calix(6)arene and found a correlation between resist development contrast, nanoscale patterned feature quality, and the polymer‐solvent solubility. Conducting Atomic Force Microscopy (AFM) in a liquid cell, we have measured swelling for hexa‐methyl acetoxy calix(6)arene in four solvents. The swelling measurements indicate that the HSS gives an indication of the Flory‐Huggins interaction parameter. These measurements provide new insights into the development behavior of nanoscale features – necessary for obtaining the ultimate lithographic resolution. In addition, it demonstrates a methodology for choosing appropriate polymer‐solvent combinations for nanoscience applications. © 2009 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 47: 2091–2105, 2009