Applied Physics Express · 2013 · 16 citations · 23 references
EngineeringMaterials EngineeringMaterials ScienceElectrochemistryElectronic MaterialsSemiconductor MaterialsElectrochemical TreatmentEtching ProcessesSemiconductor Device MaterialsSemiconductor SurfacesSurface PassivationThin Film EtchingBondingChemical EtchingElectrochemical Surface EngineeringEtch MechanismsEtchingGallium Nitride (Gan) MaterialsSurface EtchingTemplate Construction
A free-standing GaN layer was produced by combining electrochemical (EC) etching from the front surface, photo-electrochemical (PEC) etching from the back surface, and subsequent regrowth of GaN on the porous template thus produced. The EC etching resulted in the formation of etch channels on the surface portion of the starting film, whereas the back-side PEC etching gave rise to a columnar structure supporting the entire film. When the n-GaN layer was regrown on such template, the underlying columnar structure provided weak places for easy separation and transfer of the film by mechanical bonding.
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GaN: Processing, defects, and devices
S. J. Pearton, J.C. Zolper, R. J. Shul et al. · Journal of Applied Physics · 1999 · 1.8K citations
Design and characterization of GaN∕InGaN solar cells
Omkar Jani, Ian T. Ferguson, Christiana B. Honsberg et al. · Applied Physics Letters · 2007 · 568 citations