Advanced source/drain engineering for box-shaped ultrashallow junction formation using laser annealing and pre-amorphization implantation in sub-100-nm SOI CMOS

Abstract

Source/drain (S/D) engineering for ideal box-shaped junction formation using laser annealing (LA) combined with pre-amorphization implantation (PAI) is proposed and implemented in device integration for sub-100-nm CMOS on an SOI substrate. Modeling analysis for the resistance component associated with junction profile abruptness demonstrates that a noticeable reduction in parasitic series resistance with technology generation can be achieved through junction profile slope engineering. From the experimental results of LA, it is found that PAI not only controls the ultrashallow junction depth precisely, but also reduces the laser energy fluence required for impurity activation. In addition, laser annealing energy can be further reduced by use of SOI substrates in the device integration, indicating the implementation feasibility of LA to CMOS integration with an enlarged process window margin. The proposed S/D engineering is verified by the sheet resistance of junctions and the fabricated device current characteristics exhibiting substantially improved short-channel performance with higher current capability due to the box-shaped junction profile as compared with conventional rapid thermally-annealed (RTA) devices.