Publication | Closed Access
Extraction of equivalent high frequency models for TSV and RDL interconnects embedded in stacks of the 3D integration technology
10
Citations
10
References
2011
Year
Unknown Venue
EngineeringVlsi DesignComputer ArchitectureComputer-aided DesignHigh FrequencyIntegration TechnologyInterconnect (Integrated Circuits)Electromagnetic CompatibilityPhysical Design (Electronics)Advanced Packaging (Semiconductors)Modeling And SimulationComputational ElectromagneticsRedistribution LayerElectronic Packaging3D Ic ArchitectureElectrical EngineeringAntennaComputer EngineeringMicroelectronicsMicrowave EngineeringSilicon ViaApplied PhysicsRdl InterconnectsOptoelectronics3D Integration
Interconnections such as Through Silicon Via (TSV) and Redistribution Layer (RDL) constitute one of key components to acquire high performance in 3D integrated circuits. These interconnections deal with an unusual environment as they are embedded in silicon substrates which could modify largely their propagation properties. In addition architectures of TSV and BRDL are complex in terms of design and stack of materials. Thus, it is essential to characterize them in high frequency in order to analyze, predict and optimize their performance. In this paper, we present results of TSV and BRDL electrical models extractions up to 20 GHz obtained by taking advantage of an innovative de-embedding method using silicon photoconductive properties.
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