Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction

Abstract

An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous template was investigated for the reduction of air trapping and template damage caused by gases such as nitrogen and oxygen generated from UV cross-linked materials. The accuracy of the printed pattern using UV nanoimprint lithography with the porous transparent template was improved because of enhanced material adsorption and increased permeability to gaseous species. The use of volatile solvents in the UV cross-linked materials for nanoimprint lithography has been limited because of high pattern failure rates. However, using the cyclodextrin-based porous template, the UV cross-linked materials with a 5 wt. % volatile solvent exhibited well-defined nanoscale patterns. Based on this study, acceptable chemistries for the UV cross-linked materials have been expanded, which will be beneficial for future device applications using UV nanoimprint lithography.