The kinetics of photodissolution of silver in amorphous As2S3 Films

Abstract

The kinetics of photodissolution of Ag in amorphous As2S3 is investigated by measuring the electrical resistance of the dissolving Ag layer and by ion backscattering. It is concluded that “radiation damage” has first to be accumulated in the As2S3 before photodissolution commences. There then follows a stage in which the rate limiting process is light assisted activation of Ag atoms across an Ag-As2S3 interface barrier. In later stages the rate limiting process is diffusive transport of Ag from the interface into the As2S3 interior. The backscattering data cannot distinguish between a light enhanced diffusion model and a photovoltage-induced-electrotransport model.