Optical properties of MOCVD HfO₂ films

Abstract

Abstract Hafnium(IV) 2,2,6,6‐tetramethylheptane‐3,5‐dionate Hf(thd) 4 was used for depositing HfO 2 coatings by MOCVD in vertical reactor in different conditions. Monochromatic null ellipsometry was applied to characterize the film thickness and refractive index using different optical model of samples. The definition of sample optical anisotropy points to the growth of HfO 2 nanocrystals during film annealing. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)