Piezoelectric properties and residual stress of sputtered AlN thin films for MEMS applications

Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering

M.-A. Dubois, Paul Muralt · Journal of Applied Physics · 2001 · 300 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

The determination of crystallite-size and lattice-strain parameters in conjunction with the profile-refinement method for the determination of crystal structures

Th. de Keijser, E. J. Mittemeijer, H. C. F. Rozendaal · Journal of Applied Crystallography · 1983 · 290 citations

Natural Sciences, Materials Engineering, Materials Science +17

On the nature of the oxygen-related defect in aluminum nitride

J. H. Harris, R.A. Youngman, Raymond G. Teller · Journal of materials research/Pratt's guide to venture capital sources · 1990 · 263 citations

Natural Sciences, Materials Engineering, Materials Science +13

Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films

M. Clément, E. Iborra, J. Sangrador et al. · Journal of Applied Physics · 2003 · 101 citations

Natural Sciences, Materials Engineering, Materials Science +14

SAW characteristics of AlN films sputtered on silicon substrates

M. Clément, L. Vergara, J. Sangrador et al. · Ultrasonics · 2004 · 98 citations

Engineering, Materials Engineering, Materials Science +16