High-resolution deposition and etching of metals with a scanning electrochemical microscope

Abstract

A novel method is described which can be used for both the electrochemical deposition of metals in polymer films and the etching of metals with very high resolution. These faradaic processes are controlled using a scanning electrochemical microscope (similar to the scanning tunneling microscope). Patterns of silver and gold deposited in Nafion and poly(4-vinylpyridine), respectively, with a linewidth smaller than 0.5 μm, and high-resolution etching patterns in copper are shown. Extensions of this methodology to depositions of other materials, the use of other conducting polymer films, and possible applications for submicron devices are discussed.