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Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification
169
Citations
13
References
2005
Year
Unknown Venue
Relaxation ProcessExperimental VerificationEngineeringStabilityNanoelectronicsNumerical SimulationNbti ExponentThermodynamicsNbti ParametersElectrical EngineeringPhysicsBias Temperature InstabilityDisorder-controlled-kinetics ModelTime-dependent Dielectric BreakdownSemiconductor MaterialHeat TransferMicroelectronicsElectrical PropertyNon-equilibrium ProcessApplied PhysicsCondensed Matter PhysicsEquilibrium ThermodynamicsAmorphous SolidChemical KineticsElectric Field DependenciesElectrical Insulation
A model for NBTI is proposed based on disorder-controlled diffusion and drift in amorphous dielectrics. Experimental data on finFETs confirm all major predictions of the model: temperature dependence of the NBTI exponent, non-Arrhenius behavior of NBTI, log(t) and electric field dependencies of recovery. Experimental challenges with determining NBTI parameters are also highlighted.
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