Concepedia

Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment

Y.J Mei, Tien‐Chun Chang, S. J. Chang, Feng Pan, M.S.K Chen, Ai-Xiang Tuan, Shu-Ting Chou, Chia-Wen Chang

Thin Solid Films · 1997 · 14 citations · 3 references

Concepts

Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySurface ScienceThin FilmsDielectric CeramicsDielectricsNitrogen OxidesOptical Thin FilmsThin Film Electrical PropertiesThin Film Optical PropertiesDielectric ConstantOxide DielectricsOxide Film StabilitySilica-based MaterialsSilicon Dioxide

References

3

Low Dielectric Constant Interlayer Using Fluorine-Doped Silicon Oxide

Takashi Usami, Kimiaki Shimokawa, Masaki Yoshimaru · Japanese Journal of Applied Physics · 1994 · 125 citations

Engineering, Materials Engineering, Materials Science +17

Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro‐Trialkoxy‐Silane Group and Pure Water as Gas Sources

Tetsuya Homma, Yukinobu Murao, Ryuichi Yamaguchi · Journal of The Electrochemical Society · 1993 · 25 citations

Natural Sciences, Materials Engineering, Materials Science +15

Stabilizing Dielectric Constants of Fluorine‐Doped SiO2 Films by N 2 O ‐Plasma Annealing

Shunsaku Takeishi, H. Kudoh, R. Shinohara et al. · Journal of The Electrochemical Society · 1996 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +15