Concepedia

R. Shinohara

RS

Statistics

Publications

4

Citations

110

H-Index

4

Active since

1996

Affiliations

Fujitsu (Japan)(Current)

R. Shinohara is an author at Fujitsu (Japan) specializing in dielectric constant, materials science, and materials engineering.

Publications per year

1996–2002

4

Publications

4

Plasma‐Enhanced Chemical Vapor Deposition of Fluorocarbon Films with High Thermal Resistance and Low Dielectric Constants

Shunsaku Takeishi, Hiroshi Kudo, R. Shinohara et al. · Journal of The Electrochemical Society · 1997 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +17

Stabilizing Dielectric Constants of Fluorine‐Doped SiO2 Films by N 2 O ‐Plasma Annealing

Shunsaku Takeishi, H. Kudoh, R. Shinohara et al. · Journal of The Electrochemical Society · 1996 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +15

Advanced 0.5 μm FRAM device technology with full compatibility of half-micron CMOS logic device

Tatsuya Yamazaki, Ken‐ichi Inoue, Hiroyuki Miyazawa et al. · 2002 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +9

Integration of organic low-k material with Cu-damascene employing novel process

M. Ikeda, Hiroshi Kudo, R. Shinohara et al. · 2002 · 17 citations

Engineering, Materials Engineering, Materials Science +17

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