Metal deposition from a supported metal film using an excimer laser

Abstract

A method for the direct writing of metal features from a metal film supported on an optically transparent substrate using a single pulse from a high-energy excimer laser (193 nm) is presented. The technique eliminates the need for gas-phase precursors in many cases and is an inherently clean process. Results of copper depositions onto silicon substrates are shown to exemplify the technique and a mechanism for the process is proposed.