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Photodeposition of metal films with ultraviolet laser light
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1982
Year
Optical MaterialsEngineeringLaser ApplicationsOptical PropertiesMaterials FabricationSubmicrometer DimensionsPulsed Laser DepositionMaterials SciencePhotochemistryPhysicsLaser-assisted Deposition3D PrintingUltraviolet Laser LightMaskless WritingAdvanced Laser ProcessingLaser PhotochemistryMicrofabricationNatural SciencesSurface ScienceApplied PhysicsUltraviolet BeamNanofabricationThin FilmsLaser-surface InteractionsOptoelectronicsChemical Vapor Deposition
A technique for maskless writing of metal films with submicrometer dimensions is described. An ultraviolet beam from a cw or pulsed laser is used to photodissociate an organometallic gas near a gas–solid interface. The liberated metal atoms then condense in an area of dimensions comparable to the laser spot size. Experiments which elucidate the essential physics of the process have been performed.