Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Maria Berdova, Oili Ylivaara, Ville Rontu, P.T. Törmä, Riikka L. Puurunen, Sami Franssila

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2014 · 20 citations · 36 references

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Abstract

The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300 °C was investigated. The fracture strength was found to be in the range of 2.25–3.00 GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800 °C) or high humidity (95%, 60 °C) treatments.

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