Acid catalyzed resist for KrF excimer laser lithography. - Concepedia

Concepedia

Publication | Open Access

Acid catalyzed resist for KrF excimer laser lithography.

DOI Full Paper Access

14

Citations

2

References

1991

Year

Yasunobu Onishi, Hirokazu Niki, Y. Kobayashi, Rumiko Hayase, Naohiko Oyasato, Osamu Sasaki

Journal of Photopolymer Science and Technology

Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabricationChemistryLaser LithographyNanolithography MethodExcimer Lasers

References

	Year	Citations

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