Scaling the microwave plasma-assisted chemical vapor diamond deposition process to 150–200 mm substrates - Concepedia

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Scaling the microwave plasma-assisted chemical vapor diamond deposition process to 150–200 mm substrates

24

Citations

11

References

2008

Year

David King, M.K. Yaran, Thomas Schuelke, T.A. Grotjohn, D.K. Reinhard, J. Asmussen

Diamond and Related Materials

Materials ScienceEngineeringMicrofabricationSurface ScienceApplied PhysicsChemical Vapor DepositionPlasma ProcessingPlasma EtchingMm Substrates

References

	Year	Citations

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