In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers - Concepedia

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In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers

DOI Full Paper Access

33

Citations

28

References

2011

Year

Juequan Chen, Eric Louis, Rob Harmsen, T. Tsarfati, Herbert Wormeester, M. van Kampen, Willem van Schaik, Robbert Wilhelmus Elisabeth van de Kruijs, F. Bijkerk

Applied Surface Science

Surface CharacterizationEngineeringElectron-beam LithographyCarbon LayersNatural SciencesSpectroscopySurface ScienceApplied PhysicsElectron SpectroscopySurface AnalysisHydrogenChemistryPlasma EtchingExtreme UltravioletSitu Ellipsometry Study

References

	Year	Citations

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