Hardness and Structure of a-CN_x Films Synthesized by Chemical Vapor Deposition

Abstract

Mechanically hard a -CN x films were synthesized using a combination of ion bombardment and the chemical vapor deposition process using the dissociative excitation reaction of BrCN with Ar metastable atoms. Nanoindentation tests disclosed that the indentation hardness, Young's modulus and elastic recovery increased with increasing ion-accelerating voltage. Moreover, the degree of flow among clusters decreased in the ion-bombarded sample. The D (disordered)-band absorption on an infrared absorption spectrum was replaced by a C–N absorption assigned to the tertiary aromatic amine. These results suggest that the internal and external structures of the carbon nitride cluster change from the two-dimensional order to the three-dimensional order of C–N. The structure of hard a -CN x is clearly distinguishable from nitrogen-containing diamond-like carbon.