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Electrical activation of solid-phase epitaxially regrown ultra-low energy boron implants in Ge preamorphised silicon and SOI

DOI

23

Citations

7

References

2005

Year

J. J. Hamilton, E. J. H. Collart, B. Colombeau, C. Jeynes, M. Bersani, D. Giubertoni, J. A. Sharp, N. E. B. Cowern, K.J. Kirkby
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

References

YearCitations

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