Publication | Closed Access
Molecular beam epitaxy control and photoluminescence properties of InAsBi
48
Citations
10
References
2011
Year
Materials ScienceLocal Phase SeparationOverpressure RatioThick Inasbi LayersEngineeringIi-vi SemiconductorPhotoluminescenceOptical PropertiesApplied PhysicsMolecular Beam EpitaxyPhotoluminescence PropertiesEpitaxial GrowthOptoelectronicsCompound Semiconductor
Thick InAsBi layers were grown for photoluminescence (PL) characterization. The As to In overpressure ratio was carefully characterized and adjusted to achieve Bi-droplet-free surfaces. A closed loop feedback system was used to maintain the As overpressure during a 5-h deposition sequence. Despite a high degree of control of the growth parameters, evidence for local phase separation was observed in the PL spectra.
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