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High transconductance and velocity overshoot in NMOS devices at the 0.1- mu m gate-length level
168
Citations
15
References
1988
Year
Device ModelingElectrical EngineeringGate LengthVelocity OvershootVlsi DesignPhysicsEngineeringNanoelectronicsBias Temperature InstabilitySemiconductor DeviceApplied PhysicsHigh TransconductanceTransport PhenomenaSi FetsMicroelectronicsMeasured TransconductanceNmos Devices
Transport properties are investigated in self-aligned NMOS devices with gate lengths down to 0.07 mu m. Velocity overshoot was observed in the form of the highest transconductances measured to date in Si FETs, as well as in the trend of the transconductance with gate length. The measured transconductance reached 910 mu S/ mu m at liquid-nitrogen temperature and 590 mu S/ mu m at room temperature. Velocity overshoot, by making such transconductances possible, should extend the value of miniaturization to dimensions that are smaller than what was commonly assumed to be worthwhile to pursue.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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