Concepedia

A low temperature process for the reactive formation of Si3N4 layers on InSb

F. Olcaytug, K. Riedling, W. Fallmann

Thin Solid Films · 1980 · 15 citations · 3 references

DOI

Concepts

References

3

Electrical properties of Si-N films deposited on silicon from reactive plasma

A. K. Sinha, T. E. Smith · Journal of Applied Physics · 1978 · 82 citations

, , +17

The Preparation and Properties of Thin Film Silicon-Nitrogen Compounds Produced by a Radio Frequency Glow Discharge Reaction

R. G. Swann, R. R. Mehta, T. Cauge · Journal of The Electrochemical Society · 1967 · 71 citations

, , +17

Silicon oxide and nitride films deposited by an r.f. glow-discharge

Robin Joyce, H.F. Sterling, J.H. Alexander · Thin Solid Films · 1968 · 45 citations

, , +12