Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Christian Sarra‐Bournet, Nicolas Ghérardi, Hervé Glénat, Gaétan Laroche, F. Massines

Plasma Chemistry and Plasma Processing · 2010 · 25 citations · 61 references

Concepts

References

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