Journal of Applied Physics · 2011 · 124 citations · 18 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice CharacterizationDevice ModelingDevice SimulationField-effect TransistorsMetal-oxide-semiconductor Field-effect TransistorsWide Band Gap SemiconductorsChannel Doping EffectsField-effect Transistor SimulationInput CharacteristicsMetal-oxide-semiconductor Field-effect Transistor ModelingOutput CharacteristicsTransistor Output CharacteristicsTunneling Field-effect TransistorsVoltage
Tunnel field-effect transistors (TFETs) are potential successors of metal-oxide-semiconductor FETs because they promise superior input characteristics. However, the output characteristics of TFETs are poorly understood, and sometimes a superlinear onset, undesirable for circuit design, is observed. We present the first analytical model to include the impact of the drain voltage on the TFET performance. The model is developed for both a pure line-tunneling TFET and a pure point-tunneling TFET. Good agreement is observed with device simulations, especially for line-tunneling TFETs. Our model highlights and explains the superlinear onset of the output characteristics, thereby enabling an improved analysis of experimental data. Increasing the source doping level and switching to a smaller bandgap material can remove the undesired onset. We confirm this finding with our experimental data.
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Zener tunneling in semiconductors
E. O. Kane · Journal of Physics and Chemistry of Solids · 1960 · 944 citations
Complementary tunneling transistor for low power application
Pengzhan Wang, K. Hilsenbeck, T. Nirschl et al. · Solid-State Electronics · 2004 · 519 citations
Engineering, Electrical Engineering, Electronic Materials +10
Tunnel field-effect transistor without gate-drain overlap
Anne S. Verhulst, William G. Vandenberghe, Karen Maex et al. · Applied Physics Letters · 2007 · 432 citations · Full text