Publication | Closed Access
Anisotropy of the electron Hall mobility in 4H, 6H, and 15R silicon carbide
100
Citations
10
References
1994
Year
Materials ScienceSemiconductor TechnologyMagnetic PropertiesEngineeringPhysicsCrystalline DefectsHall Effect MeasurementsApplied PhysicsCondensed Matter PhysicsQuantum MaterialsElectron Hall MobilitySilicon CarbideHall-bar ConfigurationSic Single CrystalsSolid-state PhysicCarbideSemiconductor Device
Hall effect measurements in a Hall-bar configuration are performed on nitrogen-doped n-type bulk 4H, 6H, and 15R SiC single crystals cut into small parallelepipeds with their longest edges either parallel or perpendicular to the ĉ axis. In the temperature range investigated (40–700 K), an anisotropy of the electron Hall mobility is observed in all three polytypes. While the mobility perpendicular to the ĉ axis—with magnetic field perpendicular or parallel to the ĉ axis—is greater than the mobility parallel to the ĉ axis for 6H and 15R SiC, 4H SiC shows the opposite behavior.
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