X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition

Abstract

The effects of Fresnel diffraction on the patterning characteristics in synchrotron radiation lithography are greatly influenced by X-ray phase shift in the absorber, especially when a low-contrast X-ray mask is used. We show that the resolution in sub-quarter-micron region can be markedly improved without reducing the proximity gap by utilizing the phase-shifting effects in the absorber. By controlling the absorber thickness within a suitable range (1.5≤mask contrast≤4.0, -30°≥phase shift φ≥-120°), fine patterns as small as 0.1 µm can be replicated with a large exposure latitude at a large proximity gap of 30 µm. Based on these results, we propose a novel X-ray phase-shifting mask with shallowly etched patterns ( L in width) at the absorber edge as a phase shifter. This mask can be fabricated by a simple self-alignment process and also offers the possibility of 0.1-µm pattern replication at the 30-µm proximity gap by using 0.02≤ L ≤0.1 µm.