Photoresist Removal using Atomic Hydrogen Generated by Heated Catalyzer

Abstract

In this paper, a novel method for high-dose ion-implanted photoresist removal using atomic hydrogen generated by a heated tungsten catalyzer is proposed. It is found that photoresist doped as high as 1×1015 cm-2 can be removed completely. Quadruple mass spectroscopy detected hydrocarbon fragments during the atomic hydrogen treatment.