Concepedia

Hidekazu Sato

HS

Statistics

Publications

3

Citations

77

H-Index

3

Active since

2000

Affiliations

Japan Advanced Institute of Science and Technology(Current)

Fujitsu (Japan)

Hidekazu Sato is an author at Japan Advanced Institute of Science and Technology specializing in chemical vapor deposition, materials engineering, and electronic materials.

Publications per year

2000–2001

3

Publications

3

Plasma and fluorocarbon-gas free Si dry etching process using a Cat-CVD system

Akira Izumi, Hidekazu Sato, Shingi Hashioka et al. · Microelectronic Engineering · 2000 · 44 citations

, , +14

Ultrathin silicon nitride gate dielectrics prepared by catalytic chemical vapor deposition at low temperatures

Hidekazu Sato, Akira Izumi, Hideki Matsumura · Applied Physics Letters · 2000 · 21 citations · Full text

, , +17

Low-k silicon nitride film for copper interconnects process prepared by catalytic chemical vapor deposition method at low temperature

Hidekazu Sato, Akira Izumi, Atsushi Masuda et al. · Thin Solid Films · 2001 · 12 citations

, , +17

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