Hideki Matsumura - Concepedia

Author

Hideki Matsumura

Japan Advanced Institute of Science and Technology

Also Known As

HIDEKI MATSUMURA, Hideki MATSUMURA, Hideki Matsumura, Hideki Matsumura Hideki Matsumura, Matsumura, Hideki

355

Publications

5.4K

Citations

H-Index

125

Concepts

All Affiliations

Japan Advanced Institute of Science and Technology Japan Science and Technology Agency Hiroshima University Tokyo Institute of Technology

About

Hideki Matsumura is an author at Japan Advanced Institute of Science and Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	35	140	4.7K
2	Natural Sciences	5	5	166
3	Health Sciences	1	1	10
4	Medicine	1	1	20
5	Public Health	1	1	40

Hideki Matsumura

145

Publications

4.9K

Citations

H-Index

Page 1

	Year	Citations
Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method Hideki Matsumura Japanese Journal of Applied Physics Materials ScienceChemical EngineeringEngineeringThin-film FabricationSurface Science	1998	228
Theoretical Considerations on Lateral Spread of Implanted Ions Seijiro Furukawa, Hideki Matsumura, Hiroshi Ishiwara Japanese Journal of Applied Physics Theoretical AnalysisIon ImplantationEngineeringPhysicsApplied Physics	1972	204
Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous Silicon Hideki Matsumura Japanese Journal of Applied Physics Materials ScienceChemical EngineeringEngineeringApplied PhysicsAmorphous Silicon	1986	188
Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH4/H2 system Hironobu Umemoto, Kentaro Ohara, Daisuke Morita, Journal of Applied Physics EngineeringDirect DetectionChemistryChemical DepositionHydrogen Generation	2002	159
Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2 Hideki Matsumura, Hiroyuki Tachibana Applied Physics Letters EngineeringThin Film Process TechnologySilicon On InsulatorSemiconductorsSilicene	1985	134
Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon Hideki Matsumura Journal of Applied Physics Thin Film PhysicsEngineeringNew TypeThin Film Process TechnologyChemical Deposition	1989	127
Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method Hideki Matsumura Japanese Journal of Applied Physics Materials ScienceChemical EngineeringPolysilicon FilmsEngineeringMicrofabrication	1991	112
Air-stable n-type carbon nanotube field-effect transistors with Si3N4 passivation films fabricated by catalytic chemical vapor deposition Daisuke Kaminishi, Hirokazu Ozaki, Yasuhide Ohno, Applied Physics Letters EngineeringField-effect TransistorsNanocomputingVacuum DeviceSemiconductor Device	2005	97
Identification of Si and SiH in catalytic chemical vapor deposition of SiH4 by laser induced fluorescence spectroscopy Yoshitaka Nozaki, Koichi Kongo, T. Miyazaki, Journal of Applied Physics EngineeringChemistrySilicon On InsulatorChemical EngineeringSilicene	2000	93
Summary of research in NEDO Cat-CVD project in Japan Hideki Matsumura Thin Solid Films Animal StudyNedo Cat-cvd Project	2001	93

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