Hideki Matsumura

145

Publications

4.9K

Citations

H-Index

1972

Active since

Affiliations

Japan Advanced Institute of Science and Technology(Current)

Japan Science and Technology Agency

Hiroshima University

Tokyo Institute of Technology

Hideki Matsumura is an author at Japan Advanced Institute of Science and Technology specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceChemical EngineeringThin FilmsMaterials EngineeringChemistryElectrical EngineeringMicroelectronics

Publications per year

1972–2017

145

Publications

145

Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method

Hideki Matsumura · Japanese Journal of Applied Physics · 1998 · 228 citations · Full text

Materials Science, Chemical Engineering, Engineering +13

Theoretical Considerations on Lateral Spread of Implanted Ions

Seijiro Furukawa, Hideki Matsumura, Hiroshi Ishiwara · Japanese Journal of Applied Physics · 1972 · 204 citations

Theoretical Analysis, Ion Implantation, Engineering +9

Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous Silicon

Hideki Matsumura · Japanese Journal of Applied Physics · 1986 · 188 citations

Materials Science, Chemical Engineering, Engineering +12

Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH4/H2 system

Hironobu Umemoto, Kentaro Ohara, Daisuke Morita et al. · Journal of Applied Physics · 2002 · 159 citations

Engineering, Direct Detection, Chemistry +19

Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2

Hideki Matsumura, Hiroyuki Tachibana · Applied Physics Letters · 1985 · 134 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +16

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1–5 of 145