Concepedia

Publication | Closed Access

Study of resistive random access memory based on TiN/TaOx/TiN integrated into a 65nm advanced complementary metal oxide semiconductor technology

DOI

25

Citations

8

References

2012

Year

T. Diokh, Elise Le-Roux, S. Jeannot, C. Cagli, V. Jousseaume, Jean-François Nodin, M. Gros‐Jean, C. Gaumer, M. Mellier, J. Cluzel,
Thin Solid Films

References

YearCitations

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