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Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
7.9K
Citations
25
References
1990
Year
Materials ScienceElectrical EngineeringChemical DissolutionIndirect EvidenceEngineeringPhysicsWafer Scale ProcessingNanotechnologyNanoelectronicsCompound SemiconductorApplied PhysicsSemiconductor Device FabricationSilicon On InsulatorMicroelectronicsOptoelectronicsBulk Crystalline SiBand GapSemiconductor Device
Indirect evidence is presented that free-standing Si quantum wires can be fabricated without the use of epitaxial deposition or lithography. The novel approach uses electrochemical and chemical dissolution steps to define networks of isolated wires out of bulk wafers. Mesoporous Si layers of high porosity exhibit visible (red) photoluminescence at room temperature, observable with the naked eye under <1 mW unfocused (<0.1 W cm−2) green or blue laser line excitation. This is attributed to dramatic two-dimensional quantum size effects which can produce emission far above the band gap of bulk crystalline Si.
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1956 | 1.1K | |
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1989 | 662 | |
1988 | 556 | |
1985 | 494 | |
1988 | 451 | |
1984 | 321 | |
1984 | 225 | |
1988 | 174 |
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