Applied Physics Letters · 1972 · 19 citations · 7 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsDopingOptical Properties Of SemiconductorsSemiconductor HeterostructuresSemiconductor PhysicsThin Film Optical PropertiesWide Band Gap SemiconductorsElectron Escape DepthEscapeOptical GainOptical Gain In SemiconductorsPhotoresponse CharacterizationSecondary Electron EmissionSecondary Electron Production
Secondary emission measurements have been made on thick and thin epitaxially grown p-doped GaAs. Reflection mode gains of 400 at primary voltages of 20 kV have been observed for unthinned layers. The variation of gain with white-light photoresponse has also been measured. For 5-μ-thick self-supporting layers, a gain of 115 and 30 (at 10 kV primary voltage) has been measured for the reflection and transmission modes, respectively. The escape depth is estimated to be 2 μ with an escape probability of 0.14.
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GaAs-Cs: A new type of photoemitter
Jens Scheer · Solid State Communications · 1965 · 273 citations
R. E. Simon, B. F. Williams · IEEE Transactions on Nuclear Science · 1968 · 256 citations
Optimization of the InAs<i>x</i>P1−<i>x</i>–Cs2O Photocathode
L. W. James, G. A. Antypas, John J. Uebbing et al. · Journal of Applied Physics · 1971 · 38 citations