Applied Physics Letters · 1999 · 21 citations · 13 references
EngineeringMaterials EngineeringMaterials ScienceMaterials ChemistrySurface EngineeringSurface ScienceAuger Electron SpectroscopyGrain GrowthGrain Structure FormationSemiconductor SurfacesSilicon MaterialsSurface PhysicsCarbonization ProcessesReal-time MonitoringReflection High-energy Electron DiffractionSilicon CarbideSilicon Carbide (Sic) MaterialsSilicon Carbide Crystal GrowthSilicon Surface ScienceSurface Growth
The carbonization process of a preferential-domain Si(001)2×1 surface with ethylene was investigated by a combined method of reflection high-energy electron diffraction and Auger electron spectroscopy. It is found that the carbonization process during the so-called incubation time is the Si1−xCx alloy formation before the nucleation of 3C–SiC grains. A reaction model for the Si1−xCx alloy formation and for the 3C–SiC grain growth is proposed for substrate temperatures of 600–750 °C. From the model, we postulate that the external supply of Si and C should be started just at the completion of the lateral 3C–SiC grain growth at temperatures of 600–650 °C in order to obtain thick 3C–SiC layers with a flat surface morphology.
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Chris Pearson, Brian Borovsky, Michael Krueger et al. · Physical Review Letters · 1995 · 83 citations
Observation of c(4 × 4) LEED pattern induced by reaction of Si(100) surface with C2H4
Tsuyoshi Takaoka, T. Takagaki, Y. Igari et al. · Surface Science · 1996 · 50 citations