The influence of bias sputter parameters on thick copper coatings deposited using a hollow cathode

Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1974 · 2.3K citations

Natural Sciences, Materials Engineering, Materials Science +17

Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1975 · 436 citations

Natural Sciences, Materials Engineering, Materials Science +17

Sputtering Experiments with 1- to 5-keV Ar+ Ions

A. L. Southern, William R. Willis, Mark T. Robinson · Journal of Applied Physics · 1963 · 235 citations

Natural Sciences, Materials Science, Physics +15

Gas Incorporation into Sputtered Films

Harold F. Winters, E. Kay · Journal of Applied Physics · 1967 · 233 citations

Natural Sciences, Materials Engineering, Materials Science +16

Effect of ion bombardment during deposition on thick metal and ceramic deposits

Robert D. Bland, G. J. Kominiak, D.M. Mattox · Journal of Vacuum Science and Technology · 1974 · 200 citations

Engineering, Materials Engineering, Materials Science +16