Publication | Closed Access
Submicron pattern fabrication by focused ion beams
23
Citations
0
References
1985
Year
Electrical EngineeringIon ImplantationEngineeringBeam LithographyElectron-beam LithographyMicrofabricationMicroscopyApplied PhysicsSubmicron LithographyIon Beam PhysicsIon BeamIon Beam InstrumentationIntegrated CircuitsFocused Ion BeamFib TechnologyMicroelectronicsSubmicron Pattern Fabrication
A focused ion beam (FIB) technology has many advantages for submicron structure fabrication and other maskless processes. In order to develop 4–16 M(D) RAM, the FIB technology is strongly desired for its capability of submicron lithography without proximity effects.