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Fabrication of InP HEMT devices with extremely high Fmax
39
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5
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2008
Year
Unknown Venue
Electrical EngineeringLatest AdvancementsEngineeringRf SemiconductorMicrofabricationHigh-frequency DeviceElectronic EngineeringApplied PhysicsMaterial InnovationInp HemtMicroelectronicsHigh FmaxSemiconductor Device
In this paper, we present the latest advancements of short gate length InGaAs/InAlAs/InP high electron mobility transistor (InP HEMT) devices that have achieved extremely high extrapolated Fmax above 1 THz. The high Fmax is validated through the first demonstrations of sub-MMW MMICs (s-MMICs) based on these devices including the highest fundamental transistor oscillator MMIC at 347 GHz and the highest gain greater than 15 dB (greater than 5 dB per stage) at 340 GHz.
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