Co2Si, CrSi2, ZrSi2 and TiSi2 formation studied by a radioactive 31Si marker technique

Thin Films—Interdiffusion and Reactions

J. M. Poate, K. N. Tu, Jean-Claude Mayor et al. · Journal of The Electrochemical Society · 1979 · 1.7K citations

Natural Sciences, Materials Engineering, Materials Science +12

Implanted noble gas atoms as diffusion markers in silicide formation

S.S. Lau, J. W. Mayer, Helmut Müller et al. · Thin Solid Films · 1975 · 266 citations

Natural Sciences, Materials Engineering, Materials Science +5

Structure and growth kinetics of Ni2Si on silicon

K. N. Tu, J. W. Mayer · Thin Solid Films · 1975 · 212 citations

Engineering, Materials Engineering, Materials Science +10

Interactions in the Co/Si thin-film system. II. Diffusion-marker experiments

G. J. van Gurp, W. F. van der Weg, D. Sigurd · Journal of Applied Physics · 1978 · 125 citations

Natural Sciences, Materials Engineering, Materials Science +17

Identification of the dominant diffusing species in silicide formation

H. Kräutle, J. W. Mayer, Helmut Müller et al. · Applied Physics Letters · 1974 · 125 citations

Natural Sciences, Materials Science, Physics +9