Concepedia

The role of oxygen plasma in the formation of oxygen defects in HfO<sub>x</sub> films deposited at room temperature

Mochamad Januar, Suhendro Purbo Prakoso, Sen-Yao Lan, Rama Krushna Mahanty, Shou‐Yi Kuo, Kou‐Chen Liu

Journal of Materials Chemistry C · 2015 · 24 citations · 59 references

DOI

Concepts

Abstract

Oxygen plasma treatment controls different stoichiometries on the surface of a-HfO<sub>x</sub> films, giving a recipe to fabricate MIM and TFT devices at room-temperature.

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