A synchrotron radiation x-ray lithography beam line of novel design

Abstract

The new synchrotron radiation x-ray lithography facility of the University of Wisconsin is presented and discussed in detail. The facility will make use of the electron storage ring Aladdin, at the Univeristy of Wisconsin Synchrotron Radiation Center. The optical design of the beam line allows large field exposures (5×5 cm2) and a tunable bandpass spectral distribution in the range 300–5000 eV. This is achieved by a suitable combination of mirrors for the low-pass part of the filter and of absorption materials for the high-pass filters. Radiation intensity is such to allow exposures of the order of 10 s for PMMA with the beam line operated at the widest setting. The expected power and spectral distribution uniformity at the wafer is better than 2%.