First stages of the formation of Ni silicide by atom probe tomography

Abstract

Atom probe tomography assisted by femtosecond laser pulses has been performed on a Ni(Pt) film on (100)Si. Two phases with different compositions were found to form during deposition at room temperature: a NiSi layer with a relatively constant thickness of approximately 2nm and a particle of Ni2Si. The shape of the Ni2Si particle is in accordance with nucleation followed by lateral growth formation. This confirms the growth model deduced from calorimetric measurement of silicides and intermetallics and from atom probe tomography studies of the Al∕Co system. A nonuniform redistribution of Pt was also observed.