Publication | Closed Access
Growth of improved quality 3C-SiC films on 6H-SiC substrates
52
Citations
6
References
1990
Year
Materials EngineeringMaterials ScienceHigh Density6H-sic SubstratesEngineeringApplied PhysicsCarbideSemiconductor Device FabricationThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film ProcessingLtpl Spectra
Previously reported chemical vapor deposition of 3C-SiC on 6H-SiC has resulted in films with a high density of double positioning boundaries (DPBs). We have found that growth on as-grown faces of 6H-SiC crystals can yield films that are largely free of DPBs. The (111) 3C-SiC films, up to 12 μm thick, were evaluated by optical and electron microscopy and low-temperature photoluminescence (LTPL). The LTPL spectra of the films were similar to those of high quality Lely-grown 3C-SiC.
| Year | Citations | |
|---|---|---|
Page 1
Page 1