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In As ∕ Ga As self-assembled quantum-dot lasers grown by metalorganic chemical vapor deposition—Effects of postgrowth annealing on stacked InAs quantum dots
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Citations
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References
2004
Year
Materials SciencePhotonicsPostgrowth AnnealingEngineeringNanotechnologyApplied PhysicsQuantum DotsSemiconductor NanostructuresInas∕gaas Quantum DotsOptoelectronic DevicesAs ∕ GaLaser-assisted DepositionInas Quantum DotsStacking NumberOptoelectronicsCompound SemiconductorSelf-assembled Quantum-dot Lasers
We investigated the effects of postgrowth annealing on stacked InAs∕GaAs quantum dots. The blueshift in emission energy by postgrowth annealing depends on the temperature of postgrowth annealing and the growth conditions of stacked InAs quantum dots, such as a spacer thickness or a stacking number. We can control the peak wavelength of stacked InAs quantum dots by changing the temperature of postgrowth annealing and the growth conditions of stacked InAs quantum dots. We achieved continuous-wave lasing with a threshold current of 16.4mA at the wavelength of 1.245μm from five layer vertically aligned InAs quantum dots whose upper cladding layer was grown at 600°C.
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