Surface contamination and damage from CF4 and SF6 reactive ion etching of silicon oxide on gallium arsenide - Concepedia

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Surface contamination and damage from CF4 and SF6 reactive ion etching of silicon oxide on gallium arsenide

30

Citations

9

References

1990

Year

K. L. Seaward, N. Moll, William F. Stickle

Journal of Electronic Materials

Materials ScienceIon ImplantationEngineeringSurface ContaminationSurface ScienceApplied PhysicsGallium OxideSilicon OxideSemiconductor Device FabricationGallium ArsenideSilicon On InsulatorPlasma Etching

References

	Year	Citations

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