Electronics Letters · 2004 · 127 citations · 9 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsLaser DiodesQuantum DotsQuantum OptoelectronicsSemiconductor Device MaterialsSemiconductor LasersSemiconductor Thin FilmsHigh-reflectivity CoatingsLow-threshold Current LasersQuantum Dot DevicesQuantum Dot LasersQuantum Dot MaterialsQuantum Well LasersSemiconductor Quantum DotsThreshold Current Reduction
A high growth temperature step used for the GaAs spacer layer is shown to significantly improve the performance of 1.3 µm multilayer InAs/GaAs quantum-dot lasers. Extremely low room-temperature continuous-wave threshold current densities of 32.5 and 17 A/cm2 are achieved for a three-layer device with as-cleaved facets and high-reflectivity coated facets, respectively.
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Low-threshold oxide-confined 1.3-μm quantum-dot laser
Gyoungwon Park, O.B. Shchekin, Diana L. Huffaker et al. · IEEE Photonics Technology Letters · 2000 · 285 citations
GaAs-based long-wavelength lasers
V. M. Ustinov, A. E. Zhukov · Semiconductor Science and Technology · 2000 · 191 citations