ChemPhysChem · 2005 · 24 citations · 52 references
EngineeringMaterials EngineeringMaterials ScienceMaterials ChemistryPolymer ChemistrySemiconductor MaterialsDopingSemiconductor Device MaterialsSilicon MaterialsSubstrate PreparationSurface ModificationThin Film OxidationDoped SemiconductorsSilicon DopingSilicon NitrideSilicon Oxidation
Tailoring the interface: Electrografting of methacrylonitrile (pMAN) films on unevenly doped silicon substrates was studied by using several techniques. The graphic shows electrografting of pMAN on a) a deoxidised, locally doped silicon substrate and b) an oxidised, locally doped silicon substrate. Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2267/2005/z400373_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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